研究目的
To create shape memory alloy (SMA) bimorph microactuators with high-precision features using a novel fabrication process combined with electron beam (E-beam) evaporation, lift-off resist and isotropic XeF2 dry etching method.
研究成果
The novel fabrication method successfully produced SMA bimorph microactuators with high-precision features as small as 5 microns. Low E-beam deposition rate and argon employed annealing process benefited the formation of NiTi crystalline structure. The thermomechanical performance was experimentally verified and compared with simulation results, showing promising applications in biomedical devices and micro-robotics.
研究不足
The study focused on the fabrication and characterization of SMA bimorph microactuators with high-precision features, but the response speed of SMA actuators, a known limitation, was not addressed.
1：Experimental Design and Method Selection:
The study utilized a novel fabrication process combining E-beam evaporation, lift-off resist, and isotropic XeF2 dry etching to fabricate SMA bimorph microactuators.
2：Sample Selection and Data Sources:
NiTi thin film samples were prepared under different deposition rates and annealing conditions.
3：List of Experimental Equipment and Materials:
Equipment included a scanning electron microscope (SEM), x-ray diffractometer (XRD), and isotropic XeF2 dry etching machine. Materials included NiTi alloy and aluminum thin films.
4：Experimental Procedures and Operational Workflow:
The process involved photolithography, E-beam evaporation, lift-off resist, and isotropic dry etching to fabricate the microactuators.
5：Data Analysis Methods:
XRD and SEM were used to analyze the crystalline structure and surface of the NiTi thin films, respectively.
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