研究目的
To develop low-loss, broadband, and non-volatile optical switches using phase-change materials for programmable photonic integrated circuits.
研究成果
The demonstrated non-volatile optical switches based on PCMs and asymmetric directional coupler design achieve compact size, low loss, and broadband operation, making them suitable for applications in optical FPGAs, interconnects, neuromorphic computing, quantum computing, and microwave photonics. Future improvements can be made with better materials and fabrication techniques.
研究不足
Fabrication-induced imperfections such as gap changes and positional deviations of the GST layer due to limited alignment precision, which degrade performance metrics like insertion loss and crosstalk. The switches are optimized for TE polarization, and thermal heating was used for phase transition, which may not be ideal for high-speed applications.
1：Experimental Design and Method Selection:
The study uses an asymmetric directional coupler design with phase-change materials (PCMs) like Ge2Sb2Te5 (GST) to create non-volatile optical switches. Simulations were performed using frequency-domain finite-element method (COMSOL Multiphysics) and 3D finite-difference time-domain method (Lumerical) to optimize waveguide parameters and predict performance.
2：Sample Selection and Data Sources:
Fabricated devices on a silicon-on-insulator (SOI) wafer with a 220-nm-thick silicon layer on a 3-μm-thick buried oxide layer.
3：List of Experimental Equipment and Materials:
SOI wafer, electron-beam lithography (EBL) system, inductively coupled plasma (ICP) etcher, magnetron sputtering system, GST, indium tin oxide (ITO), positive tone ZEP-520A resist, PMMA resist, rapid thermal annealing (RTA) system, optical fiber setup with tunable laser and power meter.
4：Experimental Procedures and Operational Workflow:
Pattern definition via EBL, silicon etching via ICP, GST and ITO deposition via sputtering and lift-off, phase transition actuation via RTA, optical characterization using off-chip fiber setup with polarization control.
5：Data Analysis Methods:
Transmission spectra measurement, insertion loss and crosstalk calculation, comparison with simulation results.
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Electron-Beam Lithography System
JBX-6300FS
JEOL
Used for pattern definition in device fabrication.
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Tunable Laser
TSL-510
Santec
Used as a light source for optical characterization.
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Power Meter
81634B
Keysight
Used to measure optical power during characterization.
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Fiber Polarization Controller
FPC526
Thorlabs
Used to control the polarization of input light.
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Inductively Coupled Plasma Etcher
Used for silicon etching in the fabrication process.
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Magnetron Sputtering System
Used for deposition of GST and ITO layers.
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Rapid Thermal Annealing System
Used to actuate phase transition of GST.
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