研究目的
Investigating the influence of C2H2 flows on the microstructure and corrosion resistance of TiCN films doped with carbon atoms deposited on AZ31 magnesium alloy.
研究成果
The study demonstrates that varying C2H2 flows during reactive magnetron sputtering alters the microstructure (grain size, crystallinity, surface morphology) of TiCN/TiN films, leading to improved corrosion resistance in NaCl solution. The C4 sample (4 sccm C2H2 flow) showed the best performance due to fine grains, smooth surface, and reduced defects. Changing film structure directly through carbon doping is an effective way to enhance corrosion resistance without annealing, offering potential for broader applications of magnesium alloys.
研究不足
Defects like pores and pinholes are intrinsic to the PVD process and cannot be completely avoided, which may affect corrosion resistance. The study is limited to specific C2H2 flow ranges and may not cover all possible conditions. Optimization of process parameters for minimal defects could be further explored.
1：Experimental Design and Method Selection:
Reactive magnetron sputtering was used to deposit TiCN/TiN films on AZ31 substrates under varying acetylene (C2H2) flows (2 to 5 sccm) in an Ar, N2, and C2H2 mixed atmosphere. A Ti buffer layer was first deposited to reduce stress. Microstructure characterization involved TEM, GAXRD, and FESEM, while corrosion behavior was assessed using electrochemical techniques (Tafel polarization and EIS) in a 3.5% NaCl solution.
2：5% NaCl solution.
Sample Selection and Data Sources:
2. Sample Selection and Data Sources: AZ31 magnesium alloy substrates (20 × 20 × 3 mm3) were polished and cleaned. Films were prepared with different C2H2 flows (samples C2, C3, C4, C5).
3：5).
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: Magnetron sputtering system, TEM (Tecnai-F20, FEI), GAXRD (Bruker-D8), FESEM (JSM-6700F, JEOL), electrochemical workstation (Princeton VersaSTAT3, Ametek), saturated calomel electrode, platinum counter electrode, AZ31 substrates, Ti target, gases (Ar, N2, C2H2 with 99.99% purity).
4：99% purity).
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Substrates were cleaned and pre-sputtered. A Ti buffer layer (200 nm) was deposited, followed by TiN (600 nm) and TiCN (800 nm) layers. Process parameters included base pressure (2 × 10?3 Pa), substrate bias (-45 V), DC target current (0.4 A), total working pressure (0.5 Pa), fixed Ar flow (20 sccm), fixed N2 flow (5 sccm), and varying C2H2 flows (2-5 sccm). Microstructure analysis used TEM, GAXRD, and FESEM; corrosion tests involved immersion in NaCl solution and electrochemical measurements.
5：4 A), total working pressure (5 Pa), fixed Ar flow (20 sccm), fixed N2 flow (5 sccm), and varying C2H2 flows (2-5 sccm). Microstructure analysis used TEM, GAXRD, and FESEM; corrosion tests involved immersion in NaCl solution and electrochemical measurements.
Data Analysis Methods:
5. Data Analysis Methods: Grain size calculated using Scherrer formula from XRD data. Corrosion parameters (Ecorr, Icorr) derived from Tafel extrapolation; EIS data analyzed for impedance and phase angle.
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