研究目的
Investigating the synthesis and characterization of nanostructured cauliflower patterning in MWCNT doped tungsten oxide thin films for potential applications in light harvesting and energy storage.
研究成果
Nanostructured cauliflower patterning in MWCNT doped tungsten oxide thin films was successfully synthesized via AACVD, showing phase transformation, altered morphological and optical properties, and potential for light harvesting and energy storage applications. Future work could optimize doping levels and explore practical device integration.
研究不足
The films showed inconsistent electrical resistivity variations due to agglomeration of MWCNTs and nanocracks from ionic radii mismatch. Optical transmittance was low due to film color and thickness variations. The study is limited to specific doping concentrations and substrate conditions; scalability and long-term stability were not addressed.
1:Experimental Design and Method Selection:
Aerosol Assisted Chemical Vapor Deposition (AACVD) was used to synthesize thin films on silica glass substrates at 400 °C, with precursor solutions of tungsten hexacarbonyl and multiwalled carbon nanotubes (MWCNT) in toluene. The method was chosen for its simplicity, scalability, and ability to produce uniform films.
2:Sample Selection and Data Sources:
Silica glass substrates coated with SiO2 layer (Pilkington NSG) were used. Precursor concentrations varied as per Table 1 in the paper, with MWCNT doping levels from 0% to 0.35%.
3:35%. List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: Equipment includes an AACVD reactor, ultrasonic humidifier, magnetic stirrer, nitrogen gas supply, and characterization tools: Scanning Electron Microscopy (SEM), Energy Dispersive X-ray Spectroscopy (EDX), X-ray Diffractometry (XRD), Fourier Transform Infrared (FTIR) spectroscopy, UV-VIS-NIR spectrometer, and four-point probe. Materials: tungsten hexacarbonyl (99%, Aldrich), MWCNT (>95%, Aldrich), toluene (>99.6%, Sigma-Aldrich), nitrogen gas (99.9%, BOC), silica glass substrates.
4:6%, Sigma-Aldrich), nitrogen gas (9%, BOC), silica glass substrates. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Precursor solutions were prepared and stirred for homogeneity. Aerosol was generated using an ultrasonic humidifier and transported by nitrogen gas to the reactor. Substrates were cleaned ultrasonically with acetone and deionized water. Deposition was carried out at 400 °C for 1.5 hours. Post-deposition, films were characterized using SEM, EDX, XRD, FTIR, UV-VIS spectroscopy, and four-point probe measurements.
5:5 hours. Post-deposition, films were characterized using SEM, EDX, XRD, FTIR, UV-VIS spectroscopy, and four-point probe measurements. Data Analysis Methods:
5. Data Analysis Methods: XRD data analyzed for crystal structure and phase using Scherrer equation and texture coefficient. FTIR spectra analyzed for vibrational modes. UV-VIS data used Tauc plots to determine band gap energies. Electrical resistivity calculated from four-point probe measurements using standard formulas.
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Scanning Electron Microscopy
FEI Inspect F Field Emission EM
FEI
Used for surface morphological analysis and cross-sectional imaging of the thin films.
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X-ray Diffractometry
PANalytical X'Pert
PANalytical
Used for determining crystal structure, quality, and orientations of the coatings.
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Fourier Transform Infrared Spectrometer
Bruker/Tensor 27
Bruker
Used for measuring IR transmittance spectra to study vibrational modes.
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UV-VIS-NIR Spectrometer
Perkin-Elmer Fourier Transform Lambda 950
Perkin-Elmer
Used for recording transmission and absorbance spectra in the UV-VIS-NIR range.
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Energy Dispersive X-ray Spectroscopy
FEI
Used for elemental analysis and compositional mapping of the films.
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Four-point Probe
Used for measuring electrical resistance and calculating resistivity of the films.
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Ultrasonic Humidifier
Used to generate aerosol from precursor solutions.
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Magnetic Stirrer
Used for homogenizing precursor solutions.
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Tungsten Hexacarbonyl
Aldrich
Precursor for tungsten oxide deposition.
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Multi-walled Carbon Nanotubes
Aldrich
Dopant material for modifying properties of tungsten oxide films.
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Toluene
Sigma-Aldrich
Solvent for precursor solutions.
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Nitrogen Gas
BOC
Carrier gas for transporting aerosol to the reactor.
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Silica Glass Substrate
Pilkington NSG
Pilkington
Substrate for film deposition.
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