1：Experimental Design and Method Selection:

Radio-frequency reactive magnetron sputtering was used to deposit VO2 thin films on ITO-coated glass substrates at 300°C with varying O2 flow rates (2, 4, 6 sccm) and constant Ar flow rate (8 sccm). Post-deposition heat treatment at 500°C for 3 hours was applied to enhance crystallinity. Characterization included XRD, SEM, UV-vis spectroscopy, XPS, and electrochemical tests.

2：Sample Selection and Data Sources:

ITO-coated glass substrates were used. Samples were denoted as V82, V84, V86 based on O2 flow rates. Data were obtained from laboratory measurements.

3：List of Experimental Equipment and Materials:

High-purity vanadium target (

4：99%), O2 and Ar gases, ITO-coated glass substrates, epoxy adhesive for masking, 1 M NaOH electrolyte. Equipment:

RF magnetron sputtering system, step profiler (Bruker Dektak XT), XRD (PANalytical X'Pert PRO), SEM (Hitachi S-4800), UV-vis spectrophotometer (Neogen), XPS (Thermo Fisher Scientific MultiLab 2000), potentiostat (Bio-Logic SP-200).

5：0). Experimental Procedures and Operational Workflow:

4. Experimental Procedures and Operational Workflow: Chamber evacuated to 5×10^-6 mbar, pre-sputtering for 10 min, deposition at 150 W power and 3 mbar pressure. Thickness measured, films characterized structurally and optically. Electrochemical tests in three-electrode cell with Ag/AgCl reference, Pt counter, and VO2 working electrode in 0.1 M NaOH. CV, LSV, I-t, and EIS measurements performed.

6：1 M NaOH. CV, LSV, I-t, and EIS measurements performed. Data Analysis Methods:

5. Data Analysis Methods: XRD data analyzed using Scherrer's formula for crystallite size. Optical bandgap calculated via Tauc relation. Specific capacitance from CV curves using formula Cs = (∫I dV) / (A ν ΔV). EIS data interpreted with Nyquist plots.