研究目的
To grow orthorhombic GaFeO3 epitaxial films on SrTiO3 (111) substrates using a simple sol-gel method for the first time, aiming to achieve high-quality films with potential applications in multiferroic devices.
研究成果
GaFeO3 epitaxial films with c-axis orientation were successfully grown on SrTiO3 (111) substrates using a sol-gel method, exhibiting high crystallinity (FWHM 0.230°), flat surface (RMS 4.5 nm), and ferrimagnetic behavior (Ms 136 emu/cm3, Tc 174 K). This low-cost method enables large-area film production, opening avenues for applications in multiferroic devices and further research on meta-stable films.
研究不足
The Curie temperature of 174 K is below room temperature, limiting room-temperature applications; composition tuning is needed for improved properties; the method's dependency on deposition conditions requires further study.
1:Experimental Design and Method Selection:
A sol-gel method combined with spin-coating was chosen for its ability to produce large-area, low-cost epitaxial films with homogeneous composition and simple equipment.
2:Sample Selection and Data Sources:
SrTiO3 (111) substrates were used, cleaned ultrasonically with Semico clean 56 and distilled water. Precursor solutions included GaO
3:5 EMOD (3 mol/L), FeO5 EMOD (5 mol/L), and diluent agent A from Kojundo Chemical Laboratory Co., LTD. List of Experimental Equipment and Materials:
Spin coater, hot plate, syringe filter (
4:5 μm), high-resolution XRD (Rigaku Smartlab), AFM (ASYLUM MFP-3D), SEM (Hitachi S-4800), SQUID magnetometer (MPMS XL of Quantum Design). Experimental Procedures and Operational Workflow:
Prepared
5:1 M GaFeO3 solution by mixing precursors, filtered with syringe filter. Cleaned substrates, spin-coated at 1500 rpm for 20s, dried at 150°C for 5 min, repeated 20 times, annealed at 900°C for 1h in air, repeated cycle 5 times. Data Analysis Methods:
XRD for crystal structure analysis, AFM for surface roughness, SEM for morphology and thickness, SQUID for magnetic properties with volume-based magnetization calculations.
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High-resolution X-Ray Diffraction instrument
Smartlab
Rigaku
Measuring crystal structure of films
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Scanning Electron Microscope
S-4800
Hitachi
Measuring surface and cross-section morphology
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GaO1.5 EMOD materials
SYM-GAO3
Kojundo Chemical Laboratory Co., LTD
Precursor material for GaFeO3 film deposition
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FeO1.5 EMOD materials
SYM-FEO5
Kojundo Chemical Laboratory Co., LTD
Precursor material for GaFeO3 film deposition
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Diluent agent
agent A
Kojundo Chemical Laboratory Co., LTD
Diluent for coating solution
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Glass cleaner
Semico clean 56
Cleaning substrates ultrasonically
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Syringe filter
0.5 μm
Filtering solution to remove undissolved compositions
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Atomic Force Microscopy
MFP-3D
ASYLUM, Oxford Instruments Company
Analyzing surface morphology and roughness
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Superconducting quantum interference device
MPMS XL
Quantum Design Company
Characterizing in-plane magnetic properties
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