研究目的
The objective for the study is the need for the increase in reflectivity and spectral resolution of multilayer mirrors for studying the Sun's corona.
研究成果
Be-containing multilayer mirrors and filters show significant advantages in reflectivity, spectral selectivity, and stability compared to traditional materials like Mo/Si and Mg-based structures. They are promising for applications in solar astronomy telescopes, offering improved performance and durability.
研究不足
The study is limited to specific wavelength ranges (e.g., 13.2 nm, 17.1 nm, 30.4 nm) and materials (Be, Mo, Al, Si). Long-term stability beyond 20 months not fully established. Mechanical strength comparisons are preliminary. Potential oxidation of beryllium surfaces (3.5 nm BeO layer observed) may affect performance.
1：Experimental Design and Method Selection:
Multilayer mirrors are deposited on super-smooth silicon substrates by magnetron sputtering in an argon environment. Thin freestanding films were produced using a sacrificial layer technique with selective etching. Parameters of structures were determined by fitting reflection curves at a wavelength of 0.154 nm using a Philips X'Pert Pro four-crystal diffractometer. Measurements in the EUV spectral region were carried out using laboratory reflectometers (RSM-500 and LHT-30) and a UHV triaxial reflectometer on the BESSY-II synchrotron.
2：154 nm using a Philips X'Pert Pro four-crystal diffractometer. Measurements in the EUV spectral region were carried out using laboratory reflectometers (RSM-500 and LHT-30) and a UHV triaxial reflectometer on the BESSY-II synchrotron.
Sample Selection and Data Sources:
2. Sample Selection and Data Sources: Samples include Mo/Be, Be/Al, Be/Si/Al multilayers and free-standing Be films. Substrates are silicon with rms roughness of 0.1–0.2 nm.
3：1–2 nm.
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: Magnetron sputtering installation with four magnetrons, argon gas (99.998% purity), silicon substrates, beryllium, molybdenum, aluminum, silicon targets, acetic acid for etching, Philips X'Pert Pro diffractometer, RSM-500 and LHT-30 monochromators, BESSY-II synchrotron.
4：998% purity), silicon substrates, beryllium, molybdenum, aluminum, silicon targets, acetic acid for etching, Philips X'Pert Pro diffractometer, RSM-500 and LHT-30 monochromators, BESSY-II synchrotron.
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Sputtering carried out at argon pressure 0.08–0.13 Pa, current 100–1500 mA, voltage 200–400 V, distance 70–80 mm. Substrate rotation and curved diaphragm used for uniformity. Free-standing films released by etching sacrificial Mg layer in acetic acid. Reflectivity and transmissivity measured at various angles and wavelengths.
5：08–13 Pa, current 100–1500 mA, voltage 200–400 V, distance 70–80 mm. Substrate rotation and curved diaphragm used for uniformity. Free-standing films released by etching sacrificial Mg layer in acetic acid. Reflectivity and transmissivity measured at various angles and wavelengths.
Data Analysis Methods:
5. Data Analysis Methods: Fitting of reflection curves to determine layer thicknesses, densities, and roughness. Statistical accuracy estimated at ±1% based on cross-tests with synchrotron measurements.
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