研究目的
To develop and characterize advanced thin gas barrier films with alternating layers of PEALD-based Al2O3 and organic-inorganic nanohybrid layers for improved water vapor barrier properties, anticorrosion, adhesion, flexibility, and optical transmission in applications such as organic electronic devices.
研究成果
The PEALD-based Al2O3/O-I nanohybrid gas barrier films demonstrate excellent performance with ultralow WVTR, high activation energy for permeation, high optical transparency, and good flexibility, making them suitable for encapsulation in organic electronic devices. The formation of thermodynamically stable Al-O-Si bonds enhances anticorrosion and adhesion.
研究不足
The study is limited to specific materials and conditions; scalability to industrial levels and long-term stability under various environmental conditions may require further investigation. The use of accelerated aging tests might not fully replicate real-world scenarios.
1:Experimental Design and Method Selection:
The study uses an alternating layer structure of PEALD-based Al2O3 and sol-gel derived O-I nanohybrid layers. PEALD is chosen for precise inorganic layer deposition, and sol-gel method for O-I layers to leverage chemical bonding and flexibility.
2:Sample Selection and Data Sources:
Substrates include PEN and glass. O-I nanohybrid sols are synthesized using specific precursors. Calcium test cells are prepared for WVTR measurements.
3:List of Experimental Equipment and Materials:
Equipment includes PEALD reactor (LTSR-150, Leintech), TEM (JEOL JEM 2100F), AFM (VEECO Dimension 3100), UV-Vis spectrometer (V-670, Jasco), ellipsometer (M-2000, J.A. Woollam), bending machine, and thermal evaporator. Materials include TMA, IPDI, glycerol, APTES, PEG, DBTDL, GPTMS, PTMS, TTIP, ethanol, HCl, Ca, Al, PEN substrates, glass substrates, and UV-curable sealant (XNR 570-B1, Nagase ChemteX).
4:Experimental Procedures and Operational Workflow:
Clean substrates, deposit Al2O3 via PEALD with specific timing cycles, spin-coat O-I nanohybrid sols, cure, prepare Ca test cells, encapsulate, measure conductance changes under accelerated aging, and characterize using TEM, AFM, OM, UV-Vis, ellipsometry, bending tests, and immersion tests.
5:Data Analysis Methods:
WVTR calculated from Ca test data using specific equations, activation energy determined from Arrhenius plot, optical transmission measured, surface roughness analyzed via AFM, and crack density observed via OM.
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Transmission electron microscopy
JEM 2100F
JEOL
Used for measuring thickness and cross-sectional analysis of films.
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Atomic force microscopy
Dimension 3100
VEECO
Used for investigating surface roughness of films.
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Optical microscopy
EL-Einsatz
CARL ZEISS
Used for observing crack densities after bending tests.
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UV-Vis spectrometer
V-670
Jasco
Used for measuring optical transmittance of films.
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Ellipsometer
M-2000
J.A. Woollam
Used for measuring refractive index of films.
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Focused ion beam
Helios 600
FEI
Used for sample preparation for TEM.
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PEALD reactor
LTSR-150
Leintech
Used for depositing PEALD-based Al2O3 films on substrates.
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Conductance measurement device
GDM-8225A
GW INSTEK
Used for four-point conductance measurements in Ca tests.
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Thermal evaporator
Used for depositing Al and Ca electrodes and films under high vacuum.
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UV-curable sealant
XNR 570-B1
Nagase ChemteX
Used for encapsulating Ca test cells.
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Bending machine
Custom-made for applying tensile stress and conducting bending tests.
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Instron machine
3345
Instron
Used for elongation tests to evaluate flexibility.
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