研究目的
Investigating the effects of altered morphology and size on the visible-light-induced water oxidation activity and photoelectrochemical performance of BaTaO2N crystal structures.
研究成果
The morphology, size, and porosity of BaTaO2N crystal structures significantly influence their water oxidation activity and photoelectrochemical performance. Samples nitrided without KCl flux showed higher photocurrents due to porous networks and better cocatalyst dispersion, but larger particle sizes generally performed better. The findings highlight the importance of engineering photocatalytic crystals for optimal solar water splitting efficiency.
研究不足
The study is limited to specific fluxes and solute concentrations; the nitridation process may introduce defects, and the efficiency achieved is not the highest. Potential optimizations include varying nitridation times based on particle size and exploring other flux types.
1:Experimental Design and Method Selection:
A flux growth method was used to synthesize Ba5Ta4O15 precursor crystals with various morphologies and sizes by employing different fluxes (BaCl2, KCl, RbCl, CsCl, KCl+BaCl2, K2SO4) and solute concentrations (1-50 mol%). These precursors were then nitrided at 950°C for 20 h under NH3 flow with and without KCl flux to produce BaTaO2N crystal structures. The study aimed to compare the effects on water oxidation and photoelectrochemical performance.
2:Sample Selection and Data Sources:
Samples were prepared based on specific flux types and solute concentrations as detailed in Table 1 of the paper. Characterization included XRD, SEM, TEM, UV-vis spectroscopy, and performance tests for photocatalytic water oxidation and photoelectrochemical measurements.
3:List of Experimental Equipment and Materials:
Equipment included a MiniflexII XRD diffractometer (Rigaku), JSM-7600F SEM (JEOL), EM-002B HR-TEM (TOPCON), V-670 UV-vis-NIR spectrophotometer (JASCO), JEM-2800 TEM, gas chromatograph (GC-8A, Shimadzu), potentiostat (HSV-120, Hokuto), RF magnetron sputtering system, and light sources (300 W Xe lamp, AM 1.5G solar simulator). Materials were purchased from Wako Pure Chemical Industries, Ltd., including BaCO3, Ta2O5, various fluxes, Co(NO3)2·6H2O, AgNO3, La2O3, and others.
4:5G solar simulator). Materials were purchased from Wako Pure Chemical Industries, Ltd., including BaCO3, Ta2O5, various fluxes, Co(NO3)2·6H2O, AgNO3, La2O3, and others. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Precursor synthesis involved mixing solutes and fluxes, heating in a platinum crucible at 1000°C for 10 h, cooling, washing, and drying. Nitridation was performed at 950°C for 20 h under NH3 flow, with optional KCl flux. Photocatalytic tests used a side-irradiation reactor with CoOx-loaded samples, AgNO3 sacrificial agent, and La2O3 pH buffer. Photoelectrochemical measurements involved preparing photoanodes by particle transfer, sputtering Ti/Ta layers, and using a three-electrode system with linear sweep voltammetry.
5:Data Analysis Methods:
XRD patterns were compared with ICDD database, SEM and TEM images were analyzed for morphology and size using Photo Measure software, UV-vis data were converted using Kubelka-Munk method, photocurrent and O2 evolution rates were measured and compared statistically.
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X-ray diffractometer
MiniflexII
Rigaku
Acquiring XRD patterns for phase identification
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Scanning electron microscope
JSM-7600F
JEOL
Observing morphology and size of crystals
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UV-vis-NIR spectrophotometer
V-670
JASCO
Recording UV-vis diffuse reflectance spectra
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Transmission electron microscope
JEM-2800
JEOL
Examining electrode structure
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Gas chromatograph
GC-8A
Shimadzu
Measuring gas evolution in photocatalytic tests
GC-8A Series Gas Chromatograph
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Transmission electron microscope
EM-002B
TOPCON
Capturing HR-TEM images
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Potentiostat
HSV-120
Hokuto
Conducting photoelectrochemical measurements
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Xe lamp
Light source for photocatalytic and photoelectrochemical tests
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Solar simulator
XES-40S1
San-Ei Electric Co., Ltd.
Providing AM 1.5G solar light irradiation
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RF magnetron sputtering system
Depositing Ti and Ta conducting layers
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