1：Experimental Design and Method Selection:

The study used glancing-angle reactive magnetron sputtering to deposit nanostructured WO3 thin films, comparing them with dense films from conventional sputtering. The design rationale was to control morphology via glancing angle to enhance electrochromic properties. Theoretical models included the Randles–Sevcik equation for diffusion coefficients and electrochemical impedance spectroscopy for ion transport analysis.

2：Sample Selection and Data Sources:

Substrates were Sn-doped In2O3 (ITO) glasses and silicon wafers, cleaned ultrasonically. Films were deposited at glancing angles of 0° and 80°.

3：0°. List of Experimental Equipment and Materials:

3. List of Experimental Equipment and Materials: Equipment included a reactive magnetron sputtering system with a tungsten target, FE-SEM, TEM (FEI Tecnai G2 F20), electrochemical cell with Pt gauze and Hg/HgO electrodes, and Lamda 750 spectrophotometer. Materials included high-purity argon, oxygen, LiClO4, propylene carbonate, and substrates.

4：Experimental Procedures and Operational Workflow:

Substrates were cleaned and placed in a sputtering chamber. Films were deposited at specified angles under controlled gas flows and power. Morphology was analyzed by FE-SEM and TEM. Electrochromic properties were tested using cyclic voltammetry, chronoamperometry, and EIS in a three-electrode setup. Optical transmittance was measured from 300 to 800 nm.

5：Data Analysis Methods:

Data from CV curves were analyzed using the Randles–Sevcik equation to calculate diffusion coefficients. EIS data were fitted to determine lithium diffusion coefficients. Optical data were used to compute transmittance and optical density.