研究目的
Investigating the influence of yttrium concentration on the structure of coatings prepared via high-frequency magnetron sputtering of a metal target, and the possibility of obtaining stabilized high-temperature modifications of zirconium dioxide directly through reactive sputtering of metal targets.
研究成果
The method of reactive high-frequency magnetron sputtering of a Zr–Y metal target in a mixed (Ar + O2) medium successfully produces stabilized high-temperature modifications of zirconium dioxide. At 16 at % Y, cubic ZrO2 dominates, while at 8 at % Y, tetragonal ZrO2 is formed directly during deposition without additional treatments. The tetragonal phase is thermally stable in structure and morphology after annealing. This approach offers a viable alternative to ceramic target sputtering, with potential for improved coating properties in thermal-barrier applications.
研究不足
The study is limited to specific sputtering conditions (e.g., power, pressure, target composition) and may not generalize to other parameters. The use of amorphous substrates restricts applicability to other materials. The nonequilibrium nature of the process might lead to variations in real-world applications, and further optimization could be needed for industrial scaling.
1：Experimental Design and Method Selection:
The study used high-frequency (13.56 MHz) magnetron sputtering of a Zr83Y16 alloy target to prepare samples. The process involved sputtering in pure argon for metal films and in a mixed (Ar + O2) atmosphere for reactive deposition of zirconium dioxide. The power delivered to the magnetron was 600 W. To vary yttrium concentration, composite targets were created by placing pure Zr plates on the alloy surface.
2：56 MHz) magnetron sputtering of a Zr83Y16 alloy target to prepare samples. The process involved sputtering in pure argon for metal films and in a mixed (Ar + O2) atmosphere for reactive deposition of zirconium dioxide. The power delivered to the magnetron was 600 W. To vary yttrium concentration, composite targets were created by placing pure Zr plates on the alloy surface.
Sample Selection and Data Sources:
2. Sample Selection and Data Sources: Substrates were amorphous silicate glass plates (30 × 15 × 7 mm) to avoid interference in X-ray diffraction studies. Elemental compositions were determined using electron-probe X-ray spectrum microanalysis.
3：List of Experimental Equipment and Materials:
Equipment included a cylindrical magnetron (75 mm diameter), JXA-840 scanning X-ray microanalyzer, Bruker D2 PHASER diffractometer with CuKα radiation, and software packages (Eva and Topaz) for data analysis. Materials included Zr83Y16 alloy target, argon, oxygen, and zirconium plates.
4：Experimental Procedures and Operational Workflow:
The magnetron was positioned at a 45° angle and 10 cm from the substrate. For metal films, argon pressure was 4 Pa; for reactive deposition, oxygen partial pressure was 0.1 Pa. Coatings were deposited, and structures were analyzed using X-ray diffraction. Thermal stability was tested by annealing samples at 1100°C in air for 11 hours.
5：1 Pa. Coatings were deposited, and structures were analyzed using X-ray diffraction. Thermal stability was tested by annealing samples at 1100°C in air for 11 hours.
Data Analysis Methods:
5. Data Analysis Methods: X-ray diffraction patterns were analyzed using the Scherrer method for crystallite size determination and the Topaz program for phase analysis. Lattice parameters were calculated, and comparisons were made with tabular values from the ICDD database.
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