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- 摘要
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- 实验方案
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Extension of the range of profile surface roughness measurements using metrological atomic force microscope
摘要： The calibration service of profile surface roughness by using a metrological atomic force microscope is now available at National Metrology Institute of Japan (NMIJ), AIST. The calibration method is designed by referring to ISO 19606: 2017 (JIS R 1683: 2014). The scope of the ISO 19606: 2017, however, is limited to roughness measurements of surfaces with an arithmetical mean roughness, Ra, in the range of about 1 nm–30 nm. Currently there is strong demand for the measurement of surface roughness of more than 30 nm in the precision machining industry and for the measurement of surface roughness of sub-nanometer order in the semiconductor industry. In order to meet such demand, it is necessary to extend the range of surface roughness measurements in the NMIJ's calibration service. In this study, authors performed surface roughness measurements using a metrological AFM and evaluated their uncertainties. As a result of a series of measurements and evaluation of their uncertainties, it has been found that the calibration range can be extended to surfaces with an arithmetical mean roughness, Ra, in the range of about 0.2 nm–100 nm. The measurement results and the future challenges are reported in this paper.
关键词： Probe-tip diameter evaluation,Calibration,Metrological AFM,Surface roughness
更新于2025-09-19 17:15:36
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Linewidth calibration using a metrological atomic force microscope with a tip-tilting mechanism
摘要： The linewidth or critical dimension (CD) of a nanoscale line pattern is calibrated using a metrological atomic force microscope with a tip-tilting mechanism (tilting-mAFM). The tilting tip allows scanning of the line pattern’s vertical sidewalls. The tilting-mAFM performs two measurements on each side of the line pattern, and two datasets are stitched together to reconstruct the complete shape of the line pattern. Further, CD is measured based on this pattern. A linewidth standard with a subnanometer-scale uncertainty was used as a target sample to verify this CD calibration procedure. The calibrated CD using tilting-mAFM was 111.2 nm with an expanded uncertainty of 1.0 nm, which was the smallest uncertainty that was observed among the CD measurements that were reported using the tilting-AFM instruments. Further, the difference of this CD value from the reference CD was only 0.2 nm. The results reveal that tilting-mAFM can be used for CD metrology with a single-nanometer accuracy.
关键词： metrological AFM,critical dimension (CD),calibration,tilting-AFM,nanometrology,linewidth
更新于2025-09-10 09:29:36