研究目的
Investigating the effects of varying oxygen partial pressure (PO2) on the growth, porosity, and optical properties of c-axis oriented wurtzite ZnO nanostructures synthesized by glancing angle pulsed laser deposition.
研究成果
Highly c-axis oriented ZnO nanostructures with controlled porosity and excellent UV photoresponse were successfully grown using glancing angle PLD. The porosity and photoresponse of the nanostructures can be systematically modified by varying the oxygen partial pressure during deposition, without compromising the crystalline structure.
研究不足
The study is limited to the effects of oxygen partial pressure on ZnO nanostructures grown by glancing angle PLD. The potential effects of other deposition parameters or the use of different substrates were not explored.
1：Experimental Design and Method Selection
ZnO nanostructures were grown on quartz substrates using glancing angle pulsed laser deposition (PLD) method. The oxygen partial pressure (PO2) was varied to study its effects on nanostructure growth, porosity, and optical properties.
2：Sample Selection and Data Sources
High purity ZnO powder (99.999%, Aldrich) was used to prepare the target pellet. Quartz substrates were sonicated in acetone and propanol before deposition.
3：List of Experimental Equipment and Materials
Pulsed KrF excimer laser source (Compex Pro 102 F, λ = 248 nm), Rigaku SmartLab X-ray diffractometer, FESEM (Supra 55 Ziess), Quantachrome Autosorb iQ2, UV-VIS spectrometer (Cary 60, Agilent), Keithley meter, DongWoo Optron DM 500i PL spectrometer.
4：Experimental Procedures and Operational Workflow
The deposition was performed in two steps: seeding of ZnO on substrates in normal PLD geometry followed by growth of ZnO nanostructures in glancing angle PLD geometry. The substrate temperature was kept at 650°C, and the target to substrate distance was 4 cm. PO2 was varied at 7.5 Pa, 10.0 Pa, and 15.0 Pa for different samples.
5：Data Analysis Methods
XRD for crystallographic structure, SEM for surface morphology, BET method for porosity analysis, UV-VIS for optical absorption, photocurrent and I-V characteristics for photoresponse, PL spectroscopy for defect analysis.
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X-ray diffractometer
Rigaku SmartLab
Rigaku
Used for characterizing the crystallographic structure of the samples.
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Field Emission Scanning Electron Microscope
Supra 55 Ziess
Ziess
Used for investigating the surface morphology of the samples.
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UV-VIS spectrometer
Cary 60
Agilent
Used for measuring optical absorption spectra of the samples.
Cary 60 UV-Vis Spectrophotometer
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Pulsed KrF excimer laser source
Compex Pro 102 F
Not provided
Used for ablation of the ZnO target during deposition.
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Photoluminescence spectrometer
DongWoo Optron DM 500i
DongWoo Optron
Used for performing room temperature photoluminescence spectroscopy.
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