1：Experimental Design and Method Selection:

Ultrathin films of NCCO and NCO were grown by dc sputtering technique on (001)-oriented SrTiO3 and nonstoichiometric SrTiO3 with Ti-rich defects. NCO was used as a buffer layer to improve crystalline properties.

2：Sample Selection and Data Sources:

Commercial substrates of (001) SrTiO3 and (010) SrTiO3(TiO2) were used. The stoichiometry of the films was measured using an Oxford Scanning Electron Microscope Leo EVO 50 equipped with EDS and WDS detectors.

3：List of Experimental Equipment and Materials:

A Rigaku DMax-2500 PC powder diffractometer and a Panalytical X’Pert MRD PRO diffractometer for X-ray diffraction, a Multimode V atomic force microscope (AFM) for morphology and roughness measurements, and a Bruker DektakXT stylus profiler for thickness measurements.

4：Experimental Procedures and Operational Workflow:

Films were deposited at substrate temperatures in the range 100–800 °C, in mixed atmosphere of argon and oxygen with different O2/Ar ratio. After deposition, samples were in situ annealed and underwent additional ex situ thermal treatments.

5：Data Analysis Methods:

X-ray diffraction technique, scanning electron microscope imaging, AFM, and EDS and WDS were used for structural and morphological characterization.