研究目的
To provide a better understanding on the effect of external parameters such as substrate bias voltage and oxygen flow rate towards the plasma discharge of Cu/O2/Ar mixture using optical emission spectroscopy and Langmuir probe techniques.
研究成果
The optimized parameters for producing copper oxide thin films are a substrate bias voltage between -40 to -60 V and an oxygen flow rate between 8 to 12 sccm, as these conditions promote sufficient oxygen emission and ion flux for effective thin film formation.
研究不足
The study is limited to specific parameter ranges (e.g., oxygen flow rates up to 16 sccm, bias voltages up to -100 V) and may not cover all possible conditions. The use of a single target material and fixed other parameters could restrict generalizability. Potential optimizations include exploring wider parameter ranges or different gas mixtures.
1：Experimental Design and Method Selection:
The study used optical emission spectroscopy (OES) and Langmuir probe for in-situ plasma diagnostics to investigate the effects of oxygen flow rate and substrate bias voltage on Cu/O2/Ar plasma.
2：Sample Selection and Data Sources:
Plasma was generated in an rf magnetron sputtering system with a pure copper target; parameters were varied systematically.
3：List of Experimental Equipment and Materials:
Equipment includes rf magnetron sputtering system, OES system (Ocean Optics HR4000 series), Langmuir probe (Hiden Analytical ESPion system), mass flow controllers, DC power supply, vacuum pumps, and a 3-inch pure copper target. Materials include argon and oxygen gases.
4：Experimental Procedures and Operational Workflow:
The chamber was evacuated to base pressure, gases were introduced, rf power was applied, and measurements were taken at specified oxygen flow rates (0, 4, 8, 16 sccm) and substrate bias voltages (0, -40, -60, -100 V) with fixed Ar flow rate (50 sccm), working pressure (
5：5 mTorr), and rf power (400 W). OES and Langmuir probe data were collected at a point 2 cm above the substrate holder. Data Analysis Methods:
OES data were analyzed for emission intensities; Langmuir probe I-V curves were analyzed using ESPsoft software to calculate plasma density, electron temperature, and ion flux.
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