研究目的
To investigate the effectiveness of wafer-scale Si nanoconed arrays loaded with metallic nanoparticles (Au and Cu) for photoelectrochemical CO2 reduction into syngas, and to compare their performance with planar Si electrodes.
研究成果
Si nanoconed arrays with metallic nanoparticles (Au and Cu) significantly enhance photoelectrochemical CO2 reduction into syngas (H2 and CO) compared to planar Si, due to improved light absorption, charge transport, and surface area. A desirable H2/CO ratio of 2:1 was achieved, suitable for Fischer–Tropsch processes. This work provides insights for designing nanostructured PEC catalysts for solar-to-chemical conversion.
研究不足
The total faradaic efficiency for Au/Cu-nanoconed Si is below 50%, and liquid products (e.g., methanol) were difficult to separate and identify due to technical limitations. Cu nanoparticles were prone to oxidation, reducing their effectiveness for hydrocarbon production. The study did not fully explore complex product formation beyond syngas.
1:Experimental Design and Method Selection:
The study involved fabricating Si nanoconed arrays using electron beam drawing and depositing metallic nanoparticles (Au and Cu) via electrochemical deposition (E.D.) and photodeposition (P.D.) methods. Photoelectrochemical (PEC) measurements were conducted in a three-electrode cell to evaluate CO2 reduction performance.
2:Sample Selection and Data Sources:
p-type Si wafers with single-crystalline direction <100> and 10 Ω?cm-1 conductivity were used. Metallic nanoparticles were deposited from HAuCl4?H2O and CuSO4?H2O solutions. Gaseous products (H2, CO, CH4) were analyzed using gas chromatography.
3:List of Experimental Equipment and Materials:
Equipment included ELS-7500EX (Elionix Inc.) for e-beam drawing, UEP-3000-2C (ULVAC, Inc.) for Cr deposition, FE-SEM (JEOL 6701F), TEM (FEI Tecnai G2 F30), UV-visible spectrophotometer (UV-2500, Shimadzu), XPS (Escalab Mark II), electrochemical workstation (ALS/CH model 660A), gas chromatographs (GC-8A and GC-14B, Shimadzu), and a 300W Xenon lamp. Materials included ZEP-520 A, Espacer 300Z, HAuCl4?H2O, CuSO4?H2O, KHCO3, Nafion 117 membrane, and ultrapure Millipore water.
4:Experimental Procedures and Operational Workflow:
Si nanoconed arrays were fabricated via resist coating, e-beam drawing, development, Cr deposition, and liftoff. Metallic nanoparticles were deposited by E.D. or P.D. PEC measurements were performed in CO2-saturated 0.5 M KHCO3 electrolyte under Xenon lamp irradiation, with product analysis by GC.
5:5 M KHCO3 electrolyte under Xenon lamp irradiation, with product analysis by GC. Data Analysis Methods:
5. Data Analysis Methods: Faradaic efficiency was calculated from charge amounts for H2 and CO production. Photocurrent-potential curves were analyzed, and product distributions were quantified using GC data.
独家科研数据包,助您复现前沿成果,加速创新突破
获取完整内容-
Field-Emission Scanning Electron Microscope
JEOL 6701F
JEOL
Used for characterizing the morphology of Si nanoconed arrays and deposited nanoparticles.
暂无现货
预约到货通知
-
Transmission Electron Microscope
FEI Tecnai G2 F30
FEI
Used for high-resolution imaging of Cu nanoparticles on Si nanocones.
暂无现货
预约到货通知
-
UV-visible Spectrophotometer
UV-2500
Shimadzu
Used for measuring UV-vis absorption spectra of Si substrates.
暂无现货
预约到货通知
-
Gas Chromatograph
GC-8A
Shimadzu Co.
Used for analyzing gaseous hydrogen with a thermal conductivity detector (TCD).
GC-8A Series Gas Chromatograph
立即获取同款设备 -
Gas Chromatograph
GC-14B
Shimadzu Co.
Used for analyzing carbon-species products with a flame ionization detector (FID).
暂无现货
预约到货通知
-
Electron Beam Drawing System
ELS-7500EX
Elionix Inc.
Used for patterning Si nanoconed arrays via electron beam drawing.
暂无现货
预约到货通知
-
E-beam Heating Evaporation System
UEP-3000-2C
ULVAC, Inc.
Used for Cr deposition during the fabrication of Si nanoconed arrays.
暂无现货
预约到货通知
-
X-ray Photoelectron Spectrometer
Escalab Mark II
VG Scientific
Used for analyzing the chemical states of deposited metals (e.g., Cu oxidation).
暂无现货
预约到货通知
-
Electrochemical Workstation
ALS/CH model 660A
ALS/CH
Used for photoelectrochemical measurements including linear sweep voltammetry.
暂无现货
预约到货通知
-
Xenon Lamp
Used as a light source for photodeposition and photoelectrochemical reactions.
暂无现货
预约到货通知
-
Reference Electrode
RE-1B180cm
BAS Inc.
Used as the reference electrode in the three-electrode photoelectrochemical cell.
暂无现货
预约到货通知
-
Cation Exchange Membrane
Nafion 117
Used to separate cathodic and anodic compartments in the electrochemical cell.
暂无现货
预约到货通知
-
Water Purification System
Direct-Q 3UV
Millipore
Used to produce ultrapure water for experiments.
暂无现货
预约到货通知
-
Resist
ZEP-520 A
Nippon Zeon corp.
Used as the first-layer resist in the electron beam drawing process.
暂无现货
预约到货通知
-
Resist
Espacer 300Z
Showa Denko K.K.
Used as the second-layer resist for electric conductivity in e-beam drawing.
暂无现货
预约到货通知
-
登录查看剩余13件设备及参数对照表
查看全部